Metal Deposition
NOVA offers Sputtered PVD Metal Deposition services designed to deposit ultra-clean metal films with quick turn times at affordable prices.
| Sputtered Metals | Thickness | Diameter |
|---|---|---|
| Al (Aluminum) | 250 - 20,000Å | 2" - 12" |
| AlCu (Aluminum/Copper) | 250 - 20,000Å | 2" - 12" |
| AlSi (Aluminum/Silicon) | 250 - 20,000Å | 2" - 12" |
| Cu (Copper) | 250 - 20,000Å | 2" - 12" |
| Ti (Titanium) | 250 - 3,000Å | 2" - 12" |
| Ta (Tantalum) | 250 - 3,000Å | 2" - 12" |
| Cr (Chrome) | 250 - 3,000Å | 2" - 12" |
| W (Tungsten) | 250 - 3,000Å | 2" - 12" |
| TiW (Titanium Tungsten) | 200 - 3,000 Å | 2" - 12" |
| TiN (Titanium Nitride) | 200 - 3,000 � | 2" - 12" |
| TaN (Tantalum Nitride) | 200 - 2,000 Å | 2" - 12" |
The E-Beam Evaporation process allows for excellent film thickness control and can deposit up to six different materials in-situ. E-Beam Evaporation is a great option for precious metal deposition requirements and an excellent choice for wafers that require lift-off processing.
| Evaporated Metals | Thickness | Diameter |
|---|---|---|
| Al (Aluminum) | 100 - 5,000Å | 2" - 8" |
| Cu (Copper) | 100 - 3,000Å | 2" - 8" |
| Cr (Chrome) | 100 - 3,000Å | 2" - 8" |
| Sn (Tin) | 100 - 3,000Å | 2" - 8" |
| Ti (Titanium) | 100 - 3,000Å | 2" - 8" |
| Ag (Silver) | 100 - 10,000Å | 2" - 8" |
| Au (Gold) | 100 - 10,000Å | 2" - 8" |
| Pt (Platinum) | 100 - 10,000Å | 2" - 8" |
| ITO (Indium Tin Oxide) | 100 - 1,000Å | 2" - 8" |
Contact NOVA for more information phone us at (972)478-7002 or submit an online Service Request.
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NOVA offers the best competitive pricing without sacrificing quality. No order is too big or too small for us to handle. Contact Us today.